Versatile spectrometer with high resolution & efficiency
With the development of EUV lithography at 13.5nm in semiconductor manufacturing, extreme ultraviolet radiation (EUV, XUV) now has a major industrial significance. Thus, there is a demand for high-resolution and sensitive diagnostics and measurement technology. For this purpose we offer a modular XUV / EUV and soft X-ray spectrometer that can be used in plasma spectroscopy, source diagnostics and metrology. It is particularly suitable for laser plasma sources (LPS) and high harmonic sources (high harmonic generation, HHG).
This spectrometer has a flexible design and can be adapted to several applications. A very high spectral resolution can be obtained for a wide range of geometries. Typically, the resolution is only limited by the pixel size of the detector systems (13.5 µm for XUV CCDs). All parts of the spectrometer are UHV-rated.
Broadband high spectral resolution
Common spectrometers are optimized for a certain resolution at one wavelength. Due to our special design, we can address a broad bandwidth. E.g. our XUV spectrometer reaches a high resolution of <0.08 nm within the entire bandwith of 12-41 nm (peer review article). In principle, customizations in the spectral range of 2-100 nm and resolution power of > 10000 are possible.
Operation modes & usability
Our flexible spectrographs provide several operation modes, which can be changed online.
By using multi-axis motorized stages with travel ranges of several centimeters, the user is easily able to align the device. Furthermore, different optics can be placed online into the beam path to measure different beam properties. The spectrometer features the following operating modes: (1) XUV beam inspection, (2) angular-resolved spectroscopy, and (3) imaging spectroscopy with high efficiency and spectral resolution.
- a premium product
- fully customization for your application
- a spectral range of 2-100 nm
- a very high resolution power up to > 10000
- a versatile setup: motorized stages & adaptable flanges
- a light-tight setup: light shielding can be integrated
- a ultra high vacuum (UHV, < 10-9 mbar) conditions
- online operation modes & aligment & beam inspection
- a slit and slit-free setup
- an excellent signal to noise ratio (SNR) and maximum light collection efficiency