Customized solutions for imaging with short wavelengths
EUV imaging can provide nanometer resolution due to the short wavelengths of EUV radiation. We sell high performance EUV optics for imaging purposes and EUV metrology applications. Our EUV objective is based on a two-mirror configuration which minimizes aberrations. The EUV objective allows for a resolution of 50 nm and 300 µm field of view (at 13.5 nm wavelength). The objective design features high numerical aperture and a long working distance.
Applications of the objective include EUV microscopy, EUV plasma diagnostics, EUV lithography, and optical imaging.