
INDIGO OPTICAL SYSTEMS

FEATURES
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Custom Optical Solutions – Instruments spanning from vacuum ultraviolet (VUV, ~200 nm) down to extreme ultraviolet (EUV) and soft x-ray (SXR, ~2 nm), designed for advanced spectroscopy, imaging, and diagnostics.
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Non-Destructive EUV Inspection – Cutting-edge digital microscopy enabling precise, non-invasive inspection of optics, masks, logic devices, semiconductor wafers, and integrated circuits in manufacturing.
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Beamline Design & Spectrometry – High-resolution spectrometers, monochromators, reflectometers, and interferometers tailored for extreme precision applications at nanometer and picometer scales.
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Attosecond & Time-Resolved Experiments – Advanced ultrafast science solutions for pump-probe experiments, enabling dynamic process analysis down to attosecond resolution.
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Potential Applications – Angle-resolved photoelectron spectroscopy (ARPES), near-edge x-ray absorption fine structure (NEXAFS), coherent diffraction imaging (CDI), reflectometry, scatterometry, and many more.
LIGHT SOURCES SUPPORTED
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High-Harmonic Generation (HHG) – A key source for ultrafast EUV and soft x-ray experiments.
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Plasma-Based Sources – Compact, high-energy photon generation for various applications.
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Synchrotrons – High-brightness x-ray sources for advanced spectroscopy and imaging.
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Free-Electron Lasers (FELs) – Intense, coherent radiation for cutting-edge research.
We are seeking partners to advance our technology in scientific research and industrial EUV applications.